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Metal-organic chemical vapour deposition
From GAWDAwiki
(Redirected from MOCVD)
Metal-organic chemical vapour deposition (MOCVD) is a technique for depositing thin layers of atoms onto a semiconductor wafer. Using MOCVD, you can build up many layers, each of a precisely controlled thickness, to create a material which has specific optical and electrical properties. A range of semiconductor photodetectors and lasers can be created from this process.[1]



