Dichlorosilane

From GAWDAwiki

Dichlorosilane (SiH₂Cl₂) is a silicon-precursor gas used in chemical vapor deposition processes with oxygen, nitrogen or metallic (tungsten) compounds to deposit layers of silicon dioxide, silicon nitride or oxinitride or metal (tungsten) silicide layers.^[1]

References

1. http://encyclopedia.airliquidie.com