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Chemical Vapor Deposition

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Chemical Vapor Deposition (CVD) is the sum of chemical reactions that transform gaseous molecules, or precursors, into a solid material in the form of a thin film or powder on the surface of a substrate. CVD is commonly used to fabricate semiconductor devices. [1]

References

  1. http://chiuserv.ac.nctu.edu.tw/~htchiu/cvd/home.html
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